HV Process and Device高压工艺与器件ppt课件

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1、HVProcessandDevice TD HV Agenda HighvoltageproductapplicationHVTechnologyintroductionHVvoltagestandarddevice0 5um5V 40VMixed signalTechnologyFeatures0 5um5V 40VMixed signalDesignFlexibility0 5umHVMixed SignalProcessFlow ModulesIssueindevelopment Highvoltageproductapplication HVTechnologyintroduction

2、 E V dE1 E2 E3 PNjunction HVTechnologyintroduction JunctionTerminationTechnologyFieldplate MFP MetalfieldplateandRFP resistivefieldplate FieldlimitingRing FLRRESURF ReducedSURfaceField Drain HNW N N Psub Source Gate FOX HPW N P HighvoltageStandardDevice DDDStructureHVMOS for8 12v Note NDDformationth

3、roughNplustwiceimplant onlyforbigdimensionprocess HighvoltageStandardDevice DDD OffsetHVMOS for12 20v Note WithadditionallayerNDDafterpoly HighvoltageStandardDevice LDMOSHighCurrentoutput Lowdissipationoutput CDMOStechnologyiscreatedbymergingLDMOStechnologyandCMOStechnology ThemajorityofCDMOSprocess

4、esareusedfordriverandpowerICs AddingBJToptions CDMOSwillbecomeBCDprocess CMOSHighdensitydigitalandanalog CDMOSHighdensitydigitalandanalog HighCurrentoutput Lowdissipationoutput HighvoltageStandardDevice Above30v LDMOS lateraldoublediffusionMOS 40 25V Vds Vgs devicestructure Criticaldimension A Chann

5、ellengthAaffectthebreakdownofpunchthroughandRdsonB DriftextensionTOB BV MajorC TOtoTOspaceC BV MajorD M1overlapdrainsideTOD BV MinorE PolyoverlapFOXE BV MinorDrainwelltoguardringProvidethefieldisolationandreducethelatchup 0 5um5V 40VMixed signalTechnologyFeatures 0 5um5V 40VMixed signalDesignFlexibi

6、lity 0 5umHVMixed SignalProcessFlow Modules Ifonlynormal HVN Dep NMOS LowVtPMOS Dep PMOS 0 5umHVMixed SignalProcessFlow Modules PCM Pad Al3 Via2 Al2 Via1 Al1 P Plug Contact LowTCPoly2Res ONO HighRes LowTCRes Poly2 N PSD Spacer N PLDD Poly1 HighPolyRes PIPCAP ONO iscriticallayer Issueindevelopment HV

7、NMOSSub thresholdleakage Sub thresholdleakinHVNMOSVTcurvecomparedto5vnormalNMOSdevice Andfromthegraph thisdevicemusthasaparasiticalNMOSparalleltoHVNMOS theparasiticalNMOSVTishigherorsmallerthanHVNMOS Issueindevelopment Drain Source Gate A NormalHVNMOSdeviceB C Parasiticaldevice Testcondition Vd 0 1v Vsub Vs 0v Vgsweepfrom0vto5v A B C Issueindevelopment 5vP fieldMOSleakage Appendix 0 5um5V 40VMixed signalDeviceOptions Thanks

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